Customization: | Available |
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After-sales Service: | Online Service, Video or Phone Technical Support |
Warranty: | One Year Warranty |
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Clean room oven are used extensively in heat treatment/drying or burn-in of semiconductor wafers, liquid crystals, disks and other components and devices requiring clean air conditions. These units can also be prepared for installation in clean-room environments. Class 100 cleanliness is achieved by employing a HEPA filter and a back-to-front laminar circulation system. The high-performance oven provides stable performance even during heat-up or cooling.
Temp. Range | Room temp. +20~250°C |
Control accuracy | +/- 1.0°C |
Temp. Distribution Accuracy | ±2°C (at 100°C), ±3°C (at 150°C) |
Temp. Rising Time | About 25min (Room temp.→150°C). empty chamber |
Operation Function | Optional for fixed temp. or program operation |
Interior Dimensions HxWxD |
910x620x620(mm) 35.8x24.4x24.4(inch) |
Exterior Dimensions HxWxD |
1750x855x1030(mm) 68.9x33.7x40.6(inch) |
Workspace Capacity | 350L (12.3 cubic feet) |
Power Source | 3 phase AC380V |
GMS can provide varying levels of uniformity, size, temperature range; if you have a specific tolerance or specification which must be met, please contact us with your requirements so we can ensure the equipment is designed, tested, and adjusted to meet those requirements.